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題目作者分類(lèi)號(hào) 關(guān)鍵字作者單位刊名語(yǔ)言出版時(shí)間
Korean Leader Won Over By Dragon TQ175.7The Refractories Engineer英文2010-01-05
PRESIDENT'S COLUMN Peter Rooney;TQ175.7The Refractories Engineer英文2010-01-05
Pyrotek product solutions and local support assist Portland smelter TQ175.7The Refractories Engineer英文2010-01-05
Resin Free Tundish Dry Mix at SSAB Lulea Steinar Slagnes;Hakan Wahlberg;Odd Westeras;TQ175.7The Refractories Engineer英文2010-01-05
a-SiOx Coatings Grown on Dental Materials by PECVD: Compositional Analysis and Preliminary Investigation of Biocompatibility Improvements Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;TQ175biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio MaterialiChemical vapor deposition英文2010-01-05
Glass furnace refractory supply and developments - 'Interesting times' Geoff Evans;TQ175.7The Refractories Engineer英文2010-01-05
The Synthesis of Highly Loaded Cu/Al2O3 and Cu/ZnO/Al2O3 Catalysts by the Two-Step CVD of CuIIdiethylamino-2-propoxide in a Fluidized-Bed Reactor Michael Becker;Raoul Naumann d‘Alnoncourt;Kevin Kahler;Jelena Sekulic;Roland A. Fischer;Martin Muhler;TQ175copper;fluidized-bed reactor;methanol synthesis;nanocomposites;two-step deposition;zinc oxide;Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Chemical vapor deposition英文2010-01-05
Synthesis of gallium nitride nanoparticles by microwave plasma-enhanced CVD Shimada, M.;Wang, W.-N.;Okuyama, K.;TQ175Gas-phase synthesis;III-V materials;Light-emitting diode;Monodispersed particles;Semiconductor;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8527, Japan;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, KagamChemical vapor deposition英文2010-01-05
Growth and characterization of ti-ta-o thin films on si substrates by liquid injection MOCVD for high-k applications from modified titanium and tantalum precursors Devi, A.;Hellwig, M.;Barreca, D.;Parala, H.;Thomas, R.;Becker, H.-W.;Katiyar, R.S.;Fischer, R.A.;Tondello, E.;TQ175High-k oxides;LI-MOCVD;Precursor chemistry;Thin films;Ti-Ta-O;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-44780, Bochum, Germany;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-Chemical vapor deposition英文2010-01-05
Almatis Group Receives Authority to Enter Into Plan Support Agreement and Execute Related Commtment Letters TQ175.7 The Refractories Engineer英文2010-01-05
ELECTRIC STEEL MAKERS GUILD Miles Berry;TQ175.7The Refractories Engineer英文2010-01-05
THE EDITOR SPEAKS OUT John May;TQ175.7The Refractories Engineer英文2010-01-05
Synthesis of wo_3 nanogranular thin films by hot-wire CVD Houweling, Z.S.;Geus, J.W.;Schropp, R.E.I.;TQ175Amorphous;Crystalline;Rutherford backscattering spectrometry;Thin films;Tungsten oxide;Nanophotonics - Physics of Devices, Debye Institute of Nanomaterials Science, Utrecht University Princetonlaan 4, 3584 CB Utrecht, Netherlands;Electron Microscopy Utrecht, Utrecht University Padualaan 8, 3584 CH Utrecht, Netherlands;Nanophotonics - PhysicChemical vapor deposition英文2010-01-05
Raman studies of nano-and ultra-nanocrystalline diamond films grown by hot-filament CVD Klauser, F.;Steinmüller-Nethl, D.;Kaindl, R.;Bertel, E.;Memmel, N.;TQ175AFM;HFCVD;NCD;Raman;UNCD;XRD;Institute of Physical Chemistry, University of Innsbruck Innrain 52a, 6020, Innsbruck, Australia;R-BeSt coating GmbH Exlgasse 20a, 6020, Innsbruck, Australia;Institute of Mineralogy Petrography, University of Innsbruck Innrain 52, 6020, Innsbruck, AustralChemical vapor deposition英文2010-01-05
Chrome-Free Alumina Porous Refractory (Part II) SEIICHIRO KONO;AKIHIRO TSUCHINARI;TQ175Journal of the Technical Association of Refractories英文2010-01-05
Small Pipe Refractory-Lined Repair System KEISUKE GOZU;TQ175Journal of the Technical Association of Refractories英文2010-01-05
REACH and Minelco Ltd TQ175.7The Refractories Engineer英文2010-01-05
Preferential orientation in hematite films for solar hydrogen production via water splitting Cornuz, M.;Gr?tzel, M.;Sivula, K.;TQ175Institut des Sciences et Ingénierie Chimiques, ?cole Polytechnique Fédérale, Lausanne CH-1015 Lausanne, Switzerland;Institut des Sciences et Ingénierie Chimiques, ?cole Polytechnique Fédérale, Lausanne CH-1015 Lausanne, Switzerland;Institut des Sciences eChemical vapor deposition英文2010-01-05
CVD Co_3O_4 nanopyramids: A nano-platform for photo-assisted H_2 production Barreca, D.;Fornasiero, P.;Gasparotto, A.;Gombac, V.;MacCato, C.;Pozza, A.;Tondello, E.;TQ175CNR-ISTM and INSTM Department of Chemistry, Padova University, via F. Marzolo, 1, 35131 Padova, Italy;Department of Chemistry, ICCOM-CNR Trieste Research Unit, Trieste University, via L. Giorgieri, 1, 34127 Trieste, Italy;Department of Chemistry, Padova UChemical vapor deposition英文2010-01-05
Substrate-dependant ability of titanium(IV) oxide photocatalytic thin films prepared by thermal CVD to generate hydrogen gas from a sacrificial reaction Hyett, G.;Darr, J.A.;Mills, A.;Parkin, I.P.;TQ175Christopher Ingold Laboratory, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Christopher Ingold Laboratory, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Department of Pure and Applied ChemistrChemical vapor deposition英文2010-01-05

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